Atomic layer deposition ald is a thin film deposition technique based on the sequential use of a gas phase chemical process it is a subclass of chemical vapour deposition. Atomic layer deposition principles characteristics and nanotechnology applications second edition. Atomic layer deposition ald is a thin film deposition technique used in the mass production of microelectronics in this book novel nonvolatile memory devices are discussed. Ald technology is being adopted by manufacturers all over the world making atomic layer deposition principles characteristics and nanotechnology applications an indispensable title ald has become of paramount importance in a number of applications in recent years this is particularly true for microelectronics and mems devices because of the economic pressure driving devices to ever . Atomic layer deposition ald for thin film deposition is one of the most important techniques that is enabling the continuous miniaturization of semiconductor devices
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